发明名称 LIQUID RADIATION CURABLE RESINS FOR ADDITIVE FABRICATION COMPRISING A TRIARYL SULFONIUM BORATE CATIONIC PHOTOINITIATOR
摘要 Liquid radiation curable resins for additive fabrication comprising an R-substituted aromatic thioetber triaryl sulfonmm tetrakis(pentafluorophenyl) borate cationic photoinitiator is disclosed. A process for using the liquid radiation curable resins for additive fabrication and three-dimensional articles made from the liquid radiation curable resins for additive fabrication are also disclosed.
申请公布号 WO2011075553(A1) 申请公布日期 2011.06.23
申请号 WO2010US60668 申请日期 2010.12.16
申请人 DSM IP ASSETS, B.V.;SOUTHWELL, JOHN, EDMUND;XU, JIGENG;REN, KANGTAI;DAKE, KEN;EAST, SAM 发明人 SOUTHWELL, JOHN, EDMUND;XU, JIGENG;REN, KANGTAI;DAKE, KEN;EAST, SAM
分类号 C07C381/12;G03F7/00;G03F7/004;G03F7/038 主分类号 C07C381/12
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