LIQUID RADIATION CURABLE RESINS FOR ADDITIVE FABRICATION COMPRISING A TRIARYL SULFONIUM BORATE CATIONIC PHOTOINITIATOR
摘要
Liquid radiation curable resins for additive fabrication comprising an R-substituted aromatic thioetber triaryl sulfonmm tetrakis(pentafluorophenyl) borate cationic photoinitiator is disclosed. A process for using the liquid radiation curable resins for additive fabrication and three-dimensional articles made from the liquid radiation curable resins for additive fabrication are also disclosed.
申请公布号
WO2011075553(A1)
申请公布日期
2011.06.23
申请号
WO2010US60668
申请日期
2010.12.16
申请人
DSM IP ASSETS, B.V.;SOUTHWELL, JOHN, EDMUND;XU, JIGENG;REN, KANGTAI;DAKE, KEN;EAST, SAM
发明人
SOUTHWELL, JOHN, EDMUND;XU, JIGENG;REN, KANGTAI;DAKE, KEN;EAST, SAM