发明名称 |
COMPOSITION FOR ETCHING RUTHENIUM-BASED METAL AND METHOD FOR PREPARING SAME |
摘要 |
<p>Disclosed is a composition for etching a ruthenium-based metal, which is obtained by adding and mixing at least a bromine-containing compound, an oxidizing agent, a basic compound and water, and has a pH of 10 or more but less than 12. The added amount of the bromine-containing compound is 2-25% by mass in terms of bromine element and the added amount of the oxidizing agent is 0.1-12% by mass, respectively relative to the total mass. The composition is capable of effectively etching a ruthenium-based metal.</p> |
申请公布号 |
WO2011074601(A1) |
申请公布日期 |
2011.06.23 |
申请号 |
WO2010JP72552 |
申请日期 |
2010.12.15 |
申请人 |
SHOWA DENKO K.K.;SATO, FUYUKI;SAITO, YASUO |
发明人 |
SATO, FUYUKI;SAITO, YASUO |
分类号 |
C23F1/40 |
主分类号 |
C23F1/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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