TEMPERATURE CONTROL METHOD FOR CHEMICAL VAPOR DEPOSITION DEVICE

摘要

PURPOSE: A temperature control method for a chemical vapor deposition device is provided to precisely the temperature inside a chamber by accurately measuring the temperature distribution of a susceptor. CONSTITUTION: A susceptor(40) has a wafer on top. A heater is arranged inside of the susceptor and heats the wafer. A temperature sensor is arranged inside the chamber and measures the temperature of the susceptor. A rotation indication is arranged with the susceptor at a rotary part. A rotation detection sensor determines the rotation state of the susceptor through the rotation indication. An ID is assigned at a certain temperature period of the susceptor which is calculated by the rotation sensor and temperature sensor. A heater is controlled by comparing a user set temperature period with a reference temperature.