发明名称 METHOD FOR FABRICATING VERTICAL CHANNEL TRANSISTOR
摘要 <p>PURPOSE: A method for manufacturing a vertical channel transistor is provided to increase current driving performance. CONSTITUTION: A first trench is expanded on a substrate in a first horizontal direction. An active bar is expanded in a first horizontal direction by a first insulating film. A line type active pattern is expanded on a substrate in the first horizontal direction. A buried bit line(160) is expanded on the substrate in the first horizontal direction. A word line(190) is expanded in a second horizontal direction along with at least one side of a vertical channel.</p>
申请公布号 KR20110068594(A) 申请公布日期 2011.06.22
申请号 KR20090125624 申请日期 2009.12.16
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, KANG UK;OH, YONG CHUL;KIM, HUI JUNG;CHUNG, HYUN WOO;KIM, HYUN GI
分类号 H01L21/336;H01L21/768;H01L29/78 主分类号 H01L21/336
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