METHOD FOR FABRICATING VERTICAL CHANNEL TRANSISTOR
摘要
<p>PURPOSE: A method for manufacturing a vertical channel transistor is provided to increase current driving performance. CONSTITUTION: A first trench is expanded on a substrate in a first horizontal direction. An active bar is expanded in a first horizontal direction by a first insulating film. A line type active pattern is expanded on a substrate in the first horizontal direction. A buried bit line(160) is expanded on the substrate in the first horizontal direction. A word line(190) is expanded in a second horizontal direction along with at least one side of a vertical channel.</p>
申请公布号
KR20110068594(A)
申请公布日期
2011.06.22
申请号
KR20090125624
申请日期
2009.12.16
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
KIM, KANG UK;OH, YONG CHUL;KIM, HUI JUNG;CHUNG, HYUN WOO;KIM, HYUN GI