发明名称 |
ION BEAM SOURCE |
摘要 |
PURPOSE: An ion beam source is provided to prevent a resistivity charge power loss by using a pulse ion beam with an insulation target for the evaporation of the target material. CONSTITUTION: An ion source emits an ion beam arrived from a grid to a sloped target(14). An accelerating grid(13) is made of 4 discrete grids. An ion beam current control keeps a normal value with the adjustment of plasma source RF power. A circuit charges and dischares the grid capacitance. A bolt(15) performs a floating rail converter.
|
申请公布号 |
KR20110068868(A) |
申请公布日期 |
2011.06.22 |
申请号 |
KR20100126043 |
申请日期 |
2010.12.10 |
申请人 |
SPP PROCESS TECHNOLOGY SYSTEMS UK LIMITED |
发明人 |
JOHN MACNEIL;PAUL GEORGE BENNETT |
分类号 |
H01J37/30;H01J37/08;H01L21/265 |
主分类号 |
H01J37/30 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|