发明名称 ION BEAM SOURCE
摘要 PURPOSE: An ion beam source is provided to prevent a resistivity charge power loss by using a pulse ion beam with an insulation target for the evaporation of the target material. CONSTITUTION: An ion source emits an ion beam arrived from a grid to a sloped target(14). An accelerating grid(13) is made of 4 discrete grids. An ion beam current control keeps a normal value with the adjustment of plasma source RF power. A circuit charges and dischares the grid capacitance. A bolt(15) performs a floating rail converter.
申请公布号 KR20110068868(A) 申请公布日期 2011.06.22
申请号 KR20100126043 申请日期 2010.12.10
申请人 SPP PROCESS TECHNOLOGY SYSTEMS UK LIMITED 发明人 JOHN MACNEIL;PAUL GEORGE BENNETT
分类号 H01J37/30;H01J37/08;H01L21/265 主分类号 H01J37/30
代理机构 代理人
主权项
地址