| 摘要 |
In some aspects, a reticle is provided for use in forming a patterned region on a substrate using a multi-pattern, multi-exposure process. The reticle includes (a) a first pattern for the multi-pattern, multi-exposure process formed on a first region of the reticle; and (b) a second pattern for the multi-pattern, multi-exposure process formed on a second region of the reticle that is offset from first region of the reticle. Numerous other aspects are provided.
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