发明名称 Plasma generator, substrate treating apparatus including the same and substrate treating method
摘要 A plasma generator includes a gas supply member configured to supply source gas and a plurality of electrodes for generating plasma using the source gas. The plurality of electrodes have a long rod shape in a first direction and are arranged abreast in a second direction vertical to the first direction to be spaced apart from each other at the same height. A spaced distance between electrodes is adjusted by means of a distance adjusting unit including a first connector connected to a first electrode, a second connector connected to a second electrode, and a first shaft pin connecting the first and second connectors to each other. The first and second connectors rotate on the first shaft pin to adjust a spaced distance between the first and second electrodes.
申请公布号 US7963248(B2) 申请公布日期 2011.06.21
申请号 US20070888243 申请日期 2007.07.31
申请人 SEMES CO. LTD 发明人 KIM YI JUNG
分类号 C23C16/00;C23F1/00;H01L21/306 主分类号 C23C16/00
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