| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a proximity exposure device and a proximity exposure method that improve exposure precision by making tilt correction so as to make the gap between a workpiece and a mask uniform. <P>SOLUTION: The proximity exposure device includes two alignment detection systems 152 that detect a mark of the workpiece W and a mark of the mask, at least three gap sensors 153 that detect the gap between the workpiece W positioned in an exposure region P and the mask, and a mask driving mechanism 200 that can drive a mask holding unit in an XY direction and a θ direction and also drives and tilts it. The mask driving mechanism 200 adjusts alignment between the workpiece W and mask by driving the mask holding unit on a horizontal plane based upon an amount of deviation between the workpiece W and mask detected by the alignment detection systems 153, and also drives and tilts the mask holding unit based upon the gap detected by the gap sensors 153 to correct the relative tilt between the workpiece W and mask. <P>COPYRIGHT: (C)2011,JPO&INPIT |
