METHODS FOR PRODUCING SILICON NITRIDE FILMS AND SILICON OXYNITRIDE FILMS BY THERMAL CHEMICAL VAPOR DEPOSITION,申请号KR20057005036-传众专利搜索

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发明名称	METHODS FOR PRODUCING SILICON NITRIDE FILMS AND SILICON OXYNITRIDE FILMS BY THERMAL CHEMICAL VAPOR DEPOSITION
摘要
申请公布号	KR101042133(B1)	申请公布日期	2011.06.16
申请号	KR20057005036	申请日期	2003.09.23
申请人		发明人
分类号	C23C16/42;H01L21/318;C23C16/30;C23C16/34;H01L21/205;H01L21/314	主分类号	C23C16/42
代理机构		代理人
主权项
地址

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