发明名称 MASK FOR VAPOR DEPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a compact and user-friendly mask for vapor deposition, which prevents deposition patterns from being misaligned and accurately deposits films on the desired positions. SOLUTION: The mask for vapor deposition 1 includes a chip 20 which has mask openings 22 for deposition patterns depositing a film of a deposition material evaporated from a deposition source on a substrate to be deposited and a support substrate 30 which holds the chip 20, is used for deposition with one of the faces of the chip 20 overlapping the substrate to be deposited, and also includes heat shielding plates 40 which are arranged at the side of the deposition source through heat insulation members 41 in order not to block the mask openings 22. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011117028(A) 申请公布日期 2011.06.16
申请号 JP20090274223 申请日期 2009.12.02
申请人 SEIKO EPSON CORP 发明人 YOTSUYA SHINICHI
分类号 C23C14/24 主分类号 C23C14/24
代理机构 代理人
主权项
地址