| 发明名称 |
SUBSTRATE MOUNTING BASE, METHOD FOR MANUFACTURING THE SAME, AND SUBSTRATE PROCESSING APPARATUS |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a mounting base for effectively preventing etching unevenness without damaging a substrate. <P>SOLUTION: The mounting base 5A includes a base material 7 formed of a conductive material such as aluminum or stainless steel (SUS) and an insulating film 8 arranged on the base material 7. The upper surface of the insulating film 8 is made as a substrate mounting surface 50 for mounting a glass substrate S for FPD. The substrate mounting surface 50 includes a rough part 51 having a rough surface with a surface roughness Ra of≥2μm and≤6μm and a flat part 53 with a surface roughness Ra of <2μm, while encloses the circumference of the rough part 51. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
| 申请公布号 |
JP2011119326(A) |
申请公布日期 |
2011.06.16 |
| 申请号 |
JP20090273160 |
申请日期 |
2009.12.01 |
| 申请人 |
TOKYO ELECTRON LTD |
发明人 |
MINAMI MASAHITO;OKUYAMA KOICHI |
| 分类号 |
H01L21/683;H01L21/3065 |
主分类号 |
H01L21/683 |
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