| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for mounting a pellicle having air permeability capable of coping with a pressure change in the ambient atmosphere without inducing the deposition of a foreign substance on a photomask, in which the bulge of the pellicle film caused by involved air upon sticking the pellicle to the photomask can be quickly eliminated to restore the flatness of the film to an original state. <P>SOLUTION: The pellicle 1 includes a frame 2, an adhesive layer 3 layered on a lower edge face of the frame 2, and a pellicle film 4 stretched and adhered to an upper edge face of the frame 2, and has a first through hole 5 to which a filter 8 is attached, and a second through hole 6 to which a filter or a sealing material is detachably attached on a side face of the frame 2. The method for mounting the pellicle 1 on a photomask 7 comprises steps for: sticking the pellicle 1 to the photomask 7 with the adhesive layer 3; detaching the filter or a sealing material from the second through hole 6; and attaching a filter or the sealing material to the second through hole 6 after the recovery of the amount of bulging in the center of the pellicle film 4 to a predetermined value or lower. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
