METHOD FOR CLEANING FILM FORMING APPARATUS, FILM FORMING METHOD, AND FILM FORMING APPARATUS

摘要

Plasma is generated between a cathode electrode (11) and an anode electrode (12) under a first condition. After that, plasma is generated under a second condition that is different from the first condition. Under the second condition, the plasma spreads further outwardly between the cathode electrode (11) and the anode electrode (12) in comparison to the case under the first condition. As a result, materials adhering to the members provided in the vicinity of the outer peripheries of the electrodes can be quickly removed in addition to materials adhering to the electrodes.