发明名称 LIQUID PRECURSOR FOR DEPOSITING GROUP IV METAL-CONTAINING FILM
摘要 PROBLEM TO BE SOLVED: To provide a liquid precursor for depositing a group IV metal-containing film. SOLUTION: The liquid precursor is liquid group IV precursors represented by the formula: (pyr<SP>*</SP>)M(OR<SP>1</SP>)(OR<SP>2</SP>)(OR<SP>3</SP>) wherein pyr<SP>*</SP>is an alkyl substituted pyrrolyl; M is group IV metals including Ti, Zr, and Hf; R<SP>1-3</SP>can be same or different and selected from the group consisting of linear or branched C<SB>1-6</SB>alkyls, preferably C<SB>1-3</SB>alkyls; R<SP>4</SP>is selected from the group consisting of C<SB>1-6</SB>alkyls, preferably branched C<SB>3-5</SB>alkyls substituted at 2, 5 positions to prevent the pyrrolyl coordinated to the metal center inη<SP>1</SP>fashion; and n=2, 3, 4. Deposition methods using these compounds are also provided. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011117081(A) 申请公布日期 2011.06.16
申请号 JP20100272828 申请日期 2010.12.07
申请人 AIR PRODUCTS & CHEMICALS INC 发明人 LEI XINJIAN;NORMAN JOHN A T;SPENCE DANIEL P
分类号 C23C16/22;C07F7/28;C23C16/40;H01L21/316 主分类号 C23C16/22
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