发明名称 |
OPTICAL PROXIMITY CORRECTION AWARE INTEGRATED CIRCUIT DESIGN OPTIMIZATION |
摘要 |
An EDA method is implemented for modifying a layout file after place and route. The method includes storing a library of shape modifications for cells in the design library used for implementation of the circuit. The library of shape modifications includes the results of process-specific calibration of the shape modifications which indicate adjustment of a circuit parameter caused by applying the shape modifications to the cells. The layout file is analyzed to identify a cell for adjustment of the circuit parameter. A shape modification calibrated to achieve the desired adjustment is selected from the library. The shape modification is applied to the identified cell in the layout file to produce a modified layout file. The modified layout file can be used for tape out, and subsequently for manufacturing of an improved integrated circuit.
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申请公布号 |
US2011140278(A1) |
申请公布日期 |
2011.06.16 |
申请号 |
US20090636627 |
申请日期 |
2009.12.11 |
申请人 |
SYNOPSYS, INC. |
发明人 |
CHEN QIANG;TIRUMALA SRIDHAR |
分类号 |
H01L23/50;G06F17/50;H01L21/033 |
主分类号 |
H01L23/50 |
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