| 摘要 |
PURPOSE: A process chamber operating method for manufacturing a semiconductor device is provided to maintain normally the state of a process chamber without the damage of a wafer by confirming the state of the process chamber before the implementation of a process with respect to the wafer. CONSTITUTION: A normal constant(Kss) displaying the normal state of a process chamber is set. The measurement constant displaying the current state of the process chamber is measured. The measurement constant and the normal constant are compared. Based on the comparison result, the operational condition of the process chamber is adjusted if the measurement constant is out of the range of the normal constant.
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