Photomask unit, exposing method and method for manufacturing semiconductor device

摘要

A photomask unit includes a mask substrate having patterns arranged at a pitch P; and a pellicle which protects the mask substrate, wherein the pellicle is configured so that transmittance of incident light of an incident angle &thetas; (0°<&thetas;<90°) is higher than transmittance of incident light of an incident angle 0°.