发明名称 COMPOSITION FOR METAL ELECTROPLATING COMPRISING LEVELING AGENT
摘要 A composition comprising a source of metal ions and at least one additive comprising at least one polyaminoamide represented by formula (I) or derivatives of a polyaminoamide of formula (I) obtainable by complete or partial protonation, N-quarternisation or acylation.
申请公布号 KR20110063810(A) 申请公布日期 2011.06.14
申请号 KR20117007705 申请日期 2010.11.22
申请人 BASF SE 发明人 ROEGER GOEPFERT CORNELIA;RAETER ROMAN BENEDIKT;MAYER DIETER;EMNET CHARLOTTE;ARNOLD MARCO
分类号 C25D3/38 主分类号 C25D3/38
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