| 摘要 |
PURPOSE: A positive type photosensitive resin precursor composition is provided to ensure high sensitivity, excellent shelf stability after exposure, and good adhesion to a substrate. CONSTITUTION: A positive type photosensitive resin precursor composition comprises: polymer having a structure unit represented by chemical formula (1); two or more photo-acid generators; and a compound containing urea-based organic radical represented by chemical formula (2). In chemical formula (1), R^1 is 2-8 valent organic radical having two or more carbon atoms; R^2 is 2-6 valent organic radical having two or more carbon atoms; n is in a range of 10-100000; p and q are an integer of 0-4.
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