APPARATUS AND METHOD FOR CLEANING SUBSTRATES

摘要

PURPOSE: An apparatus and a method for cleaning substrates is provided to easily eliminate foreign materials remained on the surface of the substrates by implementing a dry type cleaning process before an organic material cleaning process and a wet type cleaning process. CONSTITUTION: A cleaning chamber(111) is arranged between a loading part and an organic material cleaning part. A spraying unit(130) including a spraying nozzle(131) and an ultrasound wave oscillator eliminates foreign materials remained on the surface of a substrate by spraying air containing ultrasound wave to the substrate. A dust collector(136) collects the eliminated foreign material by being parallelly arranged with the spraying nozzle. Supporting units(140a, 140b) are arranged between the spraying nozzle and the dust collector.