发明名称 RAW MATERIAL FOR CHEMICAL VAPOR DEPOSITION AND RUTHENIUM COMPOUND
摘要 PROBLEM TO BE SOLVED: To provide a raw material for chemical vapor deposition, containing a (1,5-cyclooctadiene)(η<SP>6</SP>-arene)ruthenium compound which has improved thermostability and is a liquid in a room temperature range. SOLUTION: The (1,5-cyclooctadiene)(η<SP>6</SP>-arene)ruthenium compound shown by general formula (1) (wherein R<SP>1</SP>is a hydrogen atom or a methyl group; R<SP>2</SP>is a methyl group or an ethyl group when R<SP>1</SP>is the hydrogen atom and R<SP>2</SP>is the methyl group when R<SP>1</SP>is the methyl group) is used as the raw material for chemical vapor deposition. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011106008(A) 申请公布日期 2011.06.02
申请号 JP20090264493 申请日期 2009.11.20
申请人 ADEKA CORP 发明人 WADA SENJI;ABE TETSUJI
分类号 C23C16/18;C07F15/00;C23C16/40;H01L21/28;H01L21/285 主分类号 C23C16/18
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