发明名称 ACTUATORS AND MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEMS AND METHODS USING THE SAME
摘要 An actuator includes a housing and a rotor that can be moved in relation to the housing in the effective direction of the actuator, wherein the actuator includes an advancing unit that is connected to the rotor at least part of the time. The advancing unit includes at least one deformation unit and at least one deformer for deforming the deformation unit. The at least one deformer is suited to deform the deformation unit perpendicular to the effective direction of the actuator such that the total length of the deformation unit changes in the effective direction as a result of the deformation. The actuator can be used in a projection exposure system for semiconductor lithography.
申请公布号 US2011128521(A1) 申请公布日期 2011.06.02
申请号 US201113009438 申请日期 2011.01.19
申请人 CARL ZEISS SMT GMBH 发明人 WEBER ULRICH;HEMBACHER STEFAN;SCHOEPPACH ARMIN
分类号 G03B27/54;F16H21/44 主分类号 G03B27/54
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