发明名称 ANODIZING METHOD OF A PLASMA PROCESSING CONTAINER
摘要 PURPOSE: An anodizing method for a plasma processing container is provided to prevent the leakage of electrolyte from openings of plasma processing container by carrying out anodizing in the plasma processing container with a cover member attached to the openings. CONSTITUTION: An anodizing method for a plasma processing container is as follows. Setting planned portions for a first seal member keeping vacuum in a plasma processing container are prepared on the outer wall of the plasma processing container around a part of openings and on the inner wall of the plasma processing container around the others of openings. Cover members(241) are respectively installed in the openings and electrolyte is filled in the plasma processing container. An electrode as cathode is arranged inside the plasma processing container and, at the same time, the plasma processing container is anodized.
申请公布号 KR20110058764(A) 申请公布日期 2011.06.01
申请号 KR20110043520 申请日期 2011.05.09
申请人 TOKYO ELECTRON LIMITED 发明人 DEGUCHI SHINGO;YOSITUGU TANAKA
分类号 C25D11/06;C25D11/04;H01L21/00 主分类号 C25D11/06
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