| 发明名称 |
Multi-charged beam lens and charged beam exposure apparatus using the same |
| 摘要 |
<p>A multi-charged beam lens formed by stacking three or more electrode substrates via insulators comprises a voltage application portion arranged on at least one of said at least three substrates and an insulating portion which insulates said voltage application portion from said insulators.
</p> |
| 申请公布号 |
EP1505629(A3) |
申请公布日期 |
2011.06.01 |
| 申请号 |
EP20040254720 |
申请日期 |
2004.08.05 |
| 申请人 |
CANON KABUSHIKI KAISHA;HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
NAGAE, KENICHI;ONO, HARUHITO;TANIMOTO, SAYAKA |
| 分类号 |
G03F7/20;H01J37/12;H01J37/02;H01J37/14;H01J37/305;H01J37/317;H01L21/027 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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