发明名称 Illuminator for a lithographic apparatus and method
摘要 An illuminator for a lithographic apparatus, the illuminator including an illumination mode defining element and a plurality of polarization modifiers, the polarization modifiers being moveable into or out of partial intersection with a radiation beam having an angular and spatial distribution as governed by an illumination mode defining element.
申请公布号 US7952685(B2) 申请公布日期 2011.05.31
申请号 US20070724331 申请日期 2007.03.15
申请人 CARL ZEISS SMT AG;ASML NETHERLANDS B.V. 发明人 KLAASSEN MICHEL FRANSOIS HUBERT;VAN GREEVENBROEK HENDRIKUS ROBERTUS MARIE;GEH BERND;SCHMITT-WEAVER EMIL PETER
分类号 G03B27/72;G03B27/42 主分类号 G03B27/72
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