发明名称 |
Illuminator for a lithographic apparatus and method |
摘要 |
An illuminator for a lithographic apparatus, the illuminator including an illumination mode defining element and a plurality of polarization modifiers, the polarization modifiers being moveable into or out of partial intersection with a radiation beam having an angular and spatial distribution as governed by an illumination mode defining element.
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申请公布号 |
US7952685(B2) |
申请公布日期 |
2011.05.31 |
申请号 |
US20070724331 |
申请日期 |
2007.03.15 |
申请人 |
CARL ZEISS SMT AG;ASML NETHERLANDS B.V. |
发明人 |
KLAASSEN MICHEL FRANSOIS HUBERT;VAN GREEVENBROEK HENDRIKUS ROBERTUS MARIE;GEH BERND;SCHMITT-WEAVER EMIL PETER |
分类号 |
G03B27/72;G03B27/42 |
主分类号 |
G03B27/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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