发明名称 |
Förfarande och struktur för att skydda ett passiverande skikt |
摘要 |
<p>The present invention relates to a method for protecting a passivating layer (2) comprising aluminum oxide and being formed on a surface of a silicon substrate (1) from effects caused by chemical interaction between the passivating layer (2) and a conducting electrode (4) by fabricating a barrier layer (3) between the passivating layer (2) and the conducting electrode (4). Further, the present invention relates to a corresponding structure and its use.</p> |
申请公布号 |
FI20115534(A0) |
申请公布日期 |
2011.05.30 |
申请号 |
FI20110005534 |
申请日期 |
2011.05.30 |
申请人 |
BENEQ OY |
发明人 |
SKARP, JARMO;PAKKALA, ARTO;AHONEN, SAMPO;SNECK, SAMI |
分类号 |
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主分类号 |
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代理机构 |
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代理人 |
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主权项 |
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地址 |
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