发明名称 Förfarande och struktur för att skydda ett passiverande skikt
摘要 <p>The present invention relates to a method for protecting a passivating layer (2) comprising aluminum oxide and being formed on a surface of a silicon substrate (1) from effects caused by chemical interaction between the passivating layer (2) and a conducting electrode (4) by fabricating a barrier layer (3) between the passivating layer (2) and the conducting electrode (4). Further, the present invention relates to a corresponding structure and its use.</p>
申请公布号 FI20115534(A0) 申请公布日期 2011.05.30
申请号 FI20110005534 申请日期 2011.05.30
申请人 BENEQ OY 发明人 SKARP, JARMO;PAKKALA, ARTO;AHONEN, SAMPO;SNECK, SAMI
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