发明名称 DEVICE, THIN FILM TRANSISTOR, METHOD FOR MANUFACTURING THE DEVICE AND METHOD FOR MANUFACTURING THE THIN FILM TRANSISTOR
摘要 <p>Disclosed are: a device having good characteristics and long life, wherein a functional thin film is formed in a desired region by a coating method; a thin film transistor; a method for manufacturing the device; and a method for manufacturing the thin film transistor. Specifically disclosed is a device which is characterized by comprising a substrate, a first electrode that is formed on the substrate, a functional thin film that is formed above the first electrode, and a second electrode that is provided above the functional thin film. The device is also characterized by additionally comprising, in a region surrounding the region where the functional thin film is formed, a film that contains a compound wherein a group containing a fluorine atom and a p-conjugated system are bonded by a cycloalkene structure or a cycloalkane structure.</p>
申请公布号 WO2011062226(A1) 申请公布日期 2011.05.26
申请号 WO2010JP70574 申请日期 2010.11.18
申请人 INSTITUTE OF SYSTEMS, INFORMATION TECHNOLOGIES AND NANOTECHNOLOGIES;PANASONIC CORPORATION;SUMITOMO CHEMICAL COMPANY, LIMITED;SHINKAI, SEIJI;HARAGUCHI, SHUICHI;SHIRAKI, TOMOHIRO;OGAWA, MASASHI;NAKATANI, SHUHEI;SAKANOUE, KEI;GOTO, OSAMU;KAKIMOTO, HIDENOBU 发明人 SHINKAI, SEIJI;HARAGUCHI, SHUICHI;SHIRAKI, TOMOHIRO;OGAWA, MASASHI;NAKATANI, SHUHEI;SAKANOUE, KEI;GOTO, OSAMU;KAKIMOTO, HIDENOBU
分类号 H01L51/50;H01L21/336;H01L29/786;H01L51/42;H05B33/10;H05B33/12;H05B33/22 主分类号 H01L51/50
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