| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which ensures good line width roughness (LWR) of a pattern obtained therefrom. <P>SOLUTION: The resist composition includes a polymer having a structural unit derived from a monomer represented by formula (I), a resin (A) which has an acid labile group, is insoluble or slightly soluble in an aqueous alkali solution, and can be dissolved in an aqueous alkali solution by the action of an acid, and an acid generator, wherein R<SP>1</SP>represents H or methyl; R<SP>2</SP>represents a 6-12C aromatic hydrocarbon group which may have a substituent; R<SP>3</SP>represents cyano or a 1-12C hydrocarbon group which may have a substituent, the hydrocarbon group may contain a heteroatom; A<SP>1</SP>represents a single bond, -(CH<SB>2</SB>)<SB>m1</SB>-CO-O-* or -(CH<SB>2</SB>)<SB>m2</SB>-OCO-(CH<SB>2</SB>)<SB>m3</SB>-CO-O-*, m1, m2 and m3 each represent an integer of 1-6, and * represents direct link to N. <P>COPYRIGHT: (C)2011,JPO&INPIT |
