| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin film deposition method for an optical article in which the bending of a substrate after the deposition of thin films is reduced, and to provide a thin film deposition method. SOLUTION: The thin film deposition system includes: a substrate holder 13 holding a substrate S; and a film deposition process region 30 and a reaction process region 70 formed on the sides respectively opposite to a film deposition process region 20 and a reaction process region 60 with the substrate holder therebetween, and deposits thin films simultaneously on the faces of the opposite sides in the substrate. The film thickness of the thin films is decided based on the kind and film thickness of the thin film deposited on either side of the substrate, and the thin films are deposited on both the sides of the substrate while offsetting the curving of the substrate caused by the internal stress of the thin films. COPYRIGHT: (C)2011,JPO&INPIT
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