| 摘要 |
A multilayer system on a substrate, the multilayer system being applied to the substrate by plasma deposition, characterized in that the multilayer system is configured such that it has substantial diffusion resistance to ions in an aqueous solution, wherein the current produced by the diffusion of the ions with the connection of an electric field gradient of more than 104V/m, preferably more than 105V/m, most preferred more than 107V/m is IIon<6.5×10−8 A/cm2, preferably IIon<6.5×10−10 A/cm2, particularly IIon<1×10−12 A/cm2.
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