| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress or prevent precipitation of quinonediazide-based photosensitizer from a positive resist composition without performing heat denaturation treatment; and to facilitate dissolution of the quinonediazide-based photosensitizer into the positive resist composition, when preparing the positive resist composition. <P>SOLUTION: The quinonediazide-based photosensitizer solution obtained by dissolving the quinonediazide-based photosensitizer into an organic solvent contains a thiol compound as a precipitation inhibitor for the quinonediazide-based photosensitizer. The positive-type resist composition includes an alkali-soluble resin, a crosslinking agent, the quinonediazide-based photosensitizer, and the thiol compound as the precipitation inhibitor for the quinonediazide-based photosensitizer. <P>COPYRIGHT: (C)2011,JPO&INPIT |
