发明名称 |
RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
A lithographic apparatus includes a source module that include a collector and a radiation source. The collector is configured to collect radiation from the radiation source. An illuminator is configured to condition the radiation, collected by the collector and to provide a radiation beam. A detector is disposed in a fixed positional relationship with respect to the illuminator. The detector is configured to determine a position of the radiation source relative to the collector and a position of the source module relative to the illuminator.
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申请公布号 |
US2011122389(A1) |
申请公布日期 |
2011.05.26 |
申请号 |
US200913055827 |
申请日期 |
2009.07.15 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
KLAASSEN MICHEL FRANSOIS HUBERT;GROENEVELD ROGIER HERMAN MATHIJS;STRUYCKEN ALEXANDER MATTHIJS;SWINKELS GERARDUS HUBERTUS PETRUS MARIA |
分类号 |
G03B27/34 |
主分类号 |
G03B27/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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