MULTI-COMPONENT UNARY SPUTTERING TARGET AND MANUFACTURING METHOD THEREOF, AND METHOD FOR MANUFACTURING NANO STRUCTURED THIN FILM WITH MULTI-COMPONENT ALLOY SYSTEM USING THE SAME

摘要

PURPOSE: A multi-component singular sputtering target, a manufacturing method thereof and a method of manufacturing a multi-component alloy based thin film are provided to prevent the concentration of a target component in a thin film from becoming uneven due to the difference of sputtering yield between components in a target in a reactive sputtering process. CONSTITUTION: A multi-component singular sputtering target is as follows. The target comprises the amorphous or partial-crystalized amorphous forming alloy of nitride forming metallic element and no-nitride forming metallic element. The nitride forming metallic element comprises at least one of Ti, Zr, Hf, V, Nb, Ta, Cr, Y, Mo, W, Al, Si. The no-nitride forming metallic element comprises at least one of Mg, Ca, Sc, Ni, Cu, Ag, In, Sn, La, Au, Pb.