| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a mask blank and a method of manufacturing a transfer mask, by which the mask blank or the transfer mask with a cleaned surface can be manufactured, to provide a method of manufacturing the mask blank and a method of manufacturing the transfer mask, by which the mask blank or the transfer mask suitable in the case of the use of exposure light having quantum energy over ArF excimer laser light can be manufactured, and to provide a preferable method of manufacturing the mask blank on which a chemically amplified resist film is formed. Ž<P>SOLUTION: After thin films 2 and 3 on a substrate 1 are deposited by sputtering, surfaces of the films 2 and 3 are irradiated with electromagnetic waves to decompose organic substances depositing on the surfaces of the films 2 and 3, and pure water is supplied to the surfaces of the thin films 2 and 3 to perform wet cleaning. Ž<P>COPYRIGHT: (C)2011,JPO&INPIT Ž</p> |
