| 摘要 |
FIELD: process engineering. ^ SUBSTANCE: invention relates to nozzle distribution plate intended for uniform feed of process gas into reactor. Reactor for thermal treatment of charge material comprises distribution plate to uniformly feed process gas loaded by solid particles to produce vortex layer in process space above distribution plate formed by reactor walls. Distribution plate has multiple orifices, including wall orifices arranged at such distance from reactor walls that the distance to their central axis makes 1 to 10, in particular, 2 diametres of said orifice, or distance from wall orifice central axis-to-distribution plate radius ratio makes 0.9-1. ^ EFFECT: higher flow rate and sufficient flow of process gas to prevent sintering on distribution plate. ^ 21 cl, 5 dwg |
