发明名称 Wet clean process for recovery of chamber parts
摘要 <p>A cleaning process for recovering an anodized aluminum part is particularly useful when the part has been exposed to a fluorine-containing plasma in etch reactor. The part is bathed (86) in an agitated solution of a fluoride acid, such as ammonium fluoride, which converts aluminum fluoride to a soluble fluoride. The part is rinsed (88) in water. The pores of the cleaned anodization may be resealed (90) by a submerging the part in hot agitated deionized water. </p>
申请公布号 EP2031088(A3) 申请公布日期 2011.05.18
申请号 EP20080162492 申请日期 2008.08.18
申请人 APPLIED MATERIALS, INC. 发明人 SUN, JENNIFER Y.;THACH, SENH;ZHU, XI;XU, LI;KHAN, ANISUL
分类号 C23C16/44;B08B3/08;C09K13/08;C23G1/12;H01J37/32;H01L21/02;H01L21/321 主分类号 C23C16/44
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