发明名称 |
Wet clean process for recovery of chamber parts |
摘要 |
<p>A cleaning process for recovering an anodized aluminum part is particularly useful when the part has been exposed to a fluorine-containing plasma in etch reactor. The part is bathed (86) in an agitated solution of a fluoride acid, such as ammonium fluoride, which converts aluminum fluoride to a soluble fluoride. The part is rinsed (88) in water. The pores of the cleaned anodization may be resealed (90) by a submerging the part in hot agitated deionized water.
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申请公布号 |
EP2031088(A3) |
申请公布日期 |
2011.05.18 |
申请号 |
EP20080162492 |
申请日期 |
2008.08.18 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
SUN, JENNIFER Y.;THACH, SENH;ZHU, XI;XU, LI;KHAN, ANISUL |
分类号 |
C23C16/44;B08B3/08;C09K13/08;C23G1/12;H01J37/32;H01L21/02;H01L21/321 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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