发明名称 SYSTEMS AND METHODS FOR AT LEAST PARTIALLY CONVERTING FILMS TO SILICON OXIDE AND/OR IMPROVING FILM QUALITY USING ULTRAVIOLET CURING IN STEAM AND DENSIFICATION OF FILMS USING UV CURING IN AMMONIA
摘要 PURPOSE: A systems and methods for at least partially converting films to silicon oxide and/or improving film quality using ultraviolet curing in steam and densification of films using UV curing in ammonia are provided to increase the density of the deposition layer of a substrate by applying UV light to a deposition layer during a predetermined transform period. CONSTITUTION: In a systems and methods for at least partially converting films to silicon oxide and/or improving film quality using ultraviolet curing in steam and densification of films using UV curing in ammonia, a pedestal(18) is arranged inside a chamber(14). A substrate(22) is arranged on the pedestal. A gas source(23) is combined with the chamber through at least one valve and conduit. A steam source(26) is combined with the chamber through at least one valve and conduit. A V-source(34) is arranged in the chamber and supplies broadband UV light and/or single band UV light.
申请公布号 KR20110052509(A) 申请公布日期 2011.05.18
申请号 KR20100111745 申请日期 2010.11.10
申请人 NOVELLUS SYSTEMS, INC. 发明人 VARADARAJAN BHADRI N.;VAN SCHRAVENDIJK BART
分类号 H01L21/3105 主分类号 H01L21/3105
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