发明名称 |
SYSTEMS AND METHODS FOR AT LEAST PARTIALLY CONVERTING FILMS TO SILICON OXIDE AND/OR IMPROVING FILM QUALITY USING ULTRAVIOLET CURING IN STEAM AND DENSIFICATION OF FILMS USING UV CURING IN AMMONIA |
摘要 |
PURPOSE: A systems and methods for at least partially converting films to silicon oxide and/or improving film quality using ultraviolet curing in steam and densification of films using UV curing in ammonia are provided to increase the density of the deposition layer of a substrate by applying UV light to a deposition layer during a predetermined transform period. CONSTITUTION: In a systems and methods for at least partially converting films to silicon oxide and/or improving film quality using ultraviolet curing in steam and densification of films using UV curing in ammonia, a pedestal(18) is arranged inside a chamber(14). A substrate(22) is arranged on the pedestal. A gas source(23) is combined with the chamber through at least one valve and conduit. A steam source(26) is combined with the chamber through at least one valve and conduit. A V-source(34) is arranged in the chamber and supplies broadband UV light and/or single band UV light. |
申请公布号 |
KR20110052509(A) |
申请公布日期 |
2011.05.18 |
申请号 |
KR20100111745 |
申请日期 |
2010.11.10 |
申请人 |
NOVELLUS SYSTEMS, INC. |
发明人 |
VARADARAJAN BHADRI N.;VAN SCHRAVENDIJK BART |
分类号 |
H01L21/3105 |
主分类号 |
H01L21/3105 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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