发明名称 Charge transfer semiconductor device and manufacturing method thereof
摘要 A charge coupled device is manufactured by using a crystalline silicon film that is formed by growing a crystal in parallel with a substrate by utilizing the nickel element with an amorphous silicon film used as a starting film. The crystal growth direction is made coincident with the charge transfer direction. As a result, the charge coupled device is given high charge transfer efficiency.
申请公布号 US7943968(B1) 申请公布日期 2011.05.17
申请号 US19970994038 申请日期 1997.12.18
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI SHUNPEI;TERAMOTO SATOSHI
分类号 H01L27/148;H01L21/00;H01L21/339;H01L29/762 主分类号 H01L27/148
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