发明名称 CoSi2 Schottky diode integration in BiSMOS process
摘要 Cobalt silicide (CoSi2) Schottky diodes fabricated per the current art suffer from excess leakage currents in reverse bias. In this invention, an floating p-type region encircles each anode of a CoSi2 Schottky diode comprising of one or more CoSi2 anodes. The resulting p-n junction forms a depletion region under the Schottky junction that reduces leakage current through the Schottky diodes in reverse bias operation.
申请公布号 US7943472(B2) 申请公布日期 2011.05.17
申请号 US20080023190 申请日期 2008.01.31
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 PENDHARKAR SAMEER;MINDRICELU EUGEN POMPILIU
分类号 H01L21/329;H01L21/20 主分类号 H01L21/329
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