发明名称 ILLUMINATING OPTICAL SYSTEM, EXPOSURE APPARATUS AND EXPOSURE METHOD
摘要 In an illumination optical system, a light flux from a light source is made to come into a first fly's eye optical system, and an illumination area is illuminated, via a second fly's eye optical system and a condenser optical system, with light fluxes from a plurality of mirror elements which construct the first fly's eye optical system, wherein a reflecting surface of each of the mirror elements has a width in one direction narrower than a width of each of the mirror elements in a direction perpendicular to the one direction, and a reflectance distribution in the one direction of each of the mirror elements is trapezoidal. The intensity distribution of the illumination area can be set to be a nonuniform distribution, and respective points in the illumination area can be illuminated with the light fluxes having an approximately same aperture angle distribution.
申请公布号 KR20110049792(A) 申请公布日期 2011.05.12
申请号 KR20117003060 申请日期 2009.07.10
申请人 NIKON CORPORATION 发明人 SHIRAISHI MASAYUKI
分类号 H01L21/027;G02B19/00;G03F7/20 主分类号 H01L21/027
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