| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To improve an alignment mark of an imprint template. <P>SOLUTION: The imprint lithography template is provided with an alignment mark, wherein the alignment mark is formed from dielectric material having a refractive index which differs from the refractive index of the imprint lithography template, the dielectric material having a thickness which is such that it provides a phase difference between alignment radiation which has passed through the dielectric material and alignment radiation which has not passed through the dielectric material. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
