摘要 |
PROBLEM TO BE SOLVED: To provide a film-forming apparatus which transports a long sheet-shaped substrate S through a drum 3 arranged in a vacuum treatment chamber 2, forms a plurality of stacked thin films on the sheet-shaped substrate by a plurality of film-forming units 4<SB>1</SB>, 4<SB>2</SB>and 4<SB>3</SB>arranged in the vacuum treatment chamber 2, can efficiently form the stacked film of high quality, and also can avoid the upsizing of the apparatus. SOLUTION: This film-forming apparatus includes: an indexing mechanism 5 for selectively moving a plurality of the film-forming units 4<SB>1</SB>, 4<SB>2</SB>and 4<SB>3</SB>to a predetermined film-forming position opposing to the drum 3; gate valves 8 respectively arranged at the inlet part and the outlet part of the vacuum treatment chamber 2; and the substrate-drawing-in mechanisms 9<SB>2</SB>and 9<SB>3</SB>respectively arranged on the inlet part side and the outlet part side of the vacuum treatment chamber 2. This apparatus reciprocatingly transports the sheet-shaped substrate S between both substrate-drawing-in mechanisms 9<SB>2</SB>and 9<SB>3</SB>, moves a different film-forming unit to the film-forming position each time the transporting direction is changed, and forms the film by stacking a plurality of the thin films on the sheet-shaped substrate S. COPYRIGHT: (C)2011,JPO&INPIT
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