| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a computer-readable recording medium recording a program for making a computer execute a method of determining a pattern of a mask and an effective light source distribution with which the mask is illuminated, both of which are used for an exposure apparatus including an illumination optical system which illuminates a mask with light from a light source and a projection optical system which projects a pattern of the mask onto a substrate. <P>SOLUTION: In S102, a pattern parameter for defining the shape of a virtual pattern corresponding to a target pattern is set. In S104, an evaluation position for evaluating a transfer pattern, and an evaluation item at the evaluation position are set. In S106, an illumination shape parameter for defining a virtual illumination shape is set. In S108 and S116, the parameter space consisting of a pattern parameter set in S102 and the illumination shape parameter set in S106 are constituted, and the pattern parameter and the illumination shape parameter are optimized in the parameter space. <P>COPYRIGHT: (C)2011,JPO&INPIT |
