发明名称 |
Exposure apparatus and device manufacturing method |
摘要 |
An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that forms the liquid immersion region. The exposure apparatus includes: a liquid supply mechanism that has a supply port arranged to oppose a surface of the substrate; and a buffer space formed in a channel of the liquid supply mechanism; wherein the liquid is supplied to the supply port after reserving a prescribed amount or more of liquid in the buffer space. |
申请公布号 |
EP2264531(A3) |
申请公布日期 |
2011.05.11 |
申请号 |
EP20100183476 |
申请日期 |
2004.07.08 |
申请人 |
NIKON CORPORATION;NIKON ENGINEERING CO., LTD. |
发明人 |
NAGASAKA, HIROYUKI;OKUYAMA, TAKESHI |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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