发明名称 APPARATUS FOR MAKING THIN FILM
摘要 PURPOSE: A thin film depositing apparatus is provided to uniformly transfer a reaction gas onto the entire surface of a deposition object by using a driving unit which horizontally rotates a gas supply pipe of a gas jetting unit. CONSTITUTION: A support unit(120) supports a deposition object(11). A stopper(130) separates the support unit from the deposition object. A driving unit(140) and the support unit are connected by a driving shaft(141). A reacting gas supply unit(160) supplies a reaction gas inputted from the outside to the deposition object. A gas discharging unit(170) discharges a gas which is not reacted.
申请公布号 KR101034032(B1) 申请公布日期 2011.05.11
申请号 KR20100013198 申请日期 2010.02.12
申请人 SEMIMATERIALS. CO., LTD. 发明人 PARK, JONG HOON;PARK, SUNG EUN;LEE, GEUN TEK;LEE, GUN WOO;PARK, KUN
分类号 H01L21/205;C23C16/30;C23C16/44 主分类号 H01L21/205
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