发明名称 |
APPARATUS FOR MAKING THIN FILM |
摘要 |
PURPOSE: A thin film depositing apparatus is provided to uniformly transfer a reaction gas onto the entire surface of a deposition object by using a driving unit which horizontally rotates a gas supply pipe of a gas jetting unit. CONSTITUTION: A support unit(120) supports a deposition object(11). A stopper(130) separates the support unit from the deposition object. A driving unit(140) and the support unit are connected by a driving shaft(141). A reacting gas supply unit(160) supplies a reaction gas inputted from the outside to the deposition object. A gas discharging unit(170) discharges a gas which is not reacted.
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申请公布号 |
KR101034032(B1) |
申请公布日期 |
2011.05.11 |
申请号 |
KR20100013198 |
申请日期 |
2010.02.12 |
申请人 |
SEMIMATERIALS. CO., LTD. |
发明人 |
PARK, JONG HOON;PARK, SUNG EUN;LEE, GEUN TEK;LEE, GUN WOO;PARK, KUN |
分类号 |
H01L21/205;C23C16/30;C23C16/44 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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