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发明名称
LOW PRESSURE INDUCTIVELY COUPLED HIGH DENSITY PLASMA REACTOR
摘要
申请公布号
EP1057206(B1)
申请公布日期
2011.05.11
申请号
EP19990908542
申请日期
1999.02.26
申请人
MICRON TECHNOLOGY, INC.
发明人
BLALOCK, GUY, T.;DONOHOE, KEVIN, G.
分类号
H01J37/32;C23C16/505;H01L21/205;H01L21/302;H01L21/3065;H05H1/46
主分类号
H01J37/32
代理机构
代理人
主权项
地址
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