| 摘要 |
A method to manufacture a thin film photovoltaic device is provided. The method involves mastering of sub-micron features onto a first master substrate, followed by duplication of the master surface onto one or multiple stampers, and replication of the micro-texture into the superstrate or substrate surface by using the multiple stampers. The method also discloses depositing a TCO layer on the superstrate or substrate surface having the sub-micron features, such that a side of the TCO layer distant from the superstrate or substrate surface having the sub-micron features. Thereafter, the method includes depositing the one or more semiconductor layers, the back contact layer and the cover substrate. |
