发明名称 SUBSTRATE INSPECTION SYSTEM AND SUBSTRATE INSPECTION METHOD
摘要 PURPOSE: A substrate inspecting system and substrate inspection method are provided to determine whether a foreign material is movable by comparing the coordinates and sizes of first and second inspected defects, thereby preventing foreign materials from being too much detected. CONSTITUTION: A first inspecting unit(110) inspects whether a defect occurs on the frontal surface of a substrate(105), and the coordinate and size of the defect. The first inspecting unit comprises a first photographing unit(111), a first driving unit(112), a first table unit(113), and a first cleaning unit(114). A second inspecting unit(120) inspects a defect formed on a substrate which is inspected by the first inspecting unit. The second inspecting unit includes a second photographing unit(121), a second driving unit(122), a second table unit(123), and a second cleaning unit(124). A controller(130) determines whether a defect occurs on the substrate by comparing the coordinates and sizes of inspected defects of the first and second inspecting units.
申请公布号 KR20110046901(A) 申请公布日期 2011.05.06
申请号 KR20090103606 申请日期 2009.10.29
申请人 发明人
分类号 H01L21/66 主分类号 H01L21/66
代理机构 代理人
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