发明名称 SPUTTERING SYSTEM HAVING NORMAL TARGET AND SLANT TARGET ON THE SIDE
摘要 PROBLEM TO BE SOLVED: To provide a sputtering system for sputtering workpieces having non-planar surfaces (for example, concaves, pillars and steps of a case of a notebook computer). SOLUTION: The sputtering system 1 includes a vacuum chamber 10 including a work carrier 102, a first sputtering source 104, and a second sputtering source 106. The first sputtering source 104 is located above the work carrier 102 and sputters mainly a planar portion of the workpiece 2. The second sputtering source 106 is inclined at a given angle so as to sputter a vertical portion of the workpiece 2. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011089202(A) 申请公布日期 2011.05.06
申请号 JP20100232535 申请日期 2010.10.15
申请人 SUNTEK PRECISION CORP 发明人 CHENG CHAO HSI;FU WEI YEN
分类号 C23C14/34 主分类号 C23C14/34
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