PLASMA DEPOSITION OF A THIN FILM

摘要

A plasma deposition apparatus and a method of manufacturing a thin film using the same are disclosed. The plasma deposition apparatus includes a reaction chamber inside which a first electrode and a second electrode are installed, a first power supply unit applying a first pulsed RF signal to one of the first and second electrodes, and a second power supply unit applying a second pulsed RF signal to one of the first and second electrodes. The first pulsed RF signal and the second pulsed RF signal are performed based on a predetermined deposition variable.